95mm plan apochromat objective，400-1064nm
Dimension Labs offers 95mm parfocal full-plan metallurgical microscope objective transmittance curves covering the wavelength bands 355-532 nm, 400-700 nm, and 400-1064 nm.
First, the selection guide
| Product model | DL-MMSOL | ||||||
| Product parameters | Wavelength range(nm) | Magnification（X） | Numerical aperture（NA） | Working distance（mm） | Magnification selection | Application | |
| DL-MMSOL-5x/0.15-95-PlnApo-NIR | 400~1064 | 5 | 0.15 | 45 |
Low magnification objective magnification <10X
The magnification of the medium magnification objective is 10X~50X
The magnification of the high-magnification objective lens is 50X~100X
It is recommended to start with a low magnification objective to get a good field of view and brightness. According to the needs of the object to be observed, it is gradually observed under a high-magnification objective.
|
Visible observations Infrared observation Laser processing |
Visible Observations:
(1) Observation and shooting of metal, resin, printing surface and other surfaces; (2) Optical system for trace fluid analysis; (3) Optical systems for the purpose of observing and analyzing cells, microorganisms, etc.
Laser processing:
(1) Peeling of protective films, organic films, etc.; (2) Metal, aluminum and other metal wiring cutting, the exposure of the underlying pattern; (3) Repair of various defects of FPD; (4) photomask repair; (5) Marking, trimming, image formation, local annealing, and scribing.
Infrared observation: Enables non-destructive inspections that cannot be done under visible light.
(1) Thickness measurement of liquid crystal films, silicon substrates, etc.; (2) Non-destructive evaluation and 3D installation evaluation within MEMS; (3) Sensors for internal observation of semiconductor packaging (IC) and wafer bonding void evaluation; (4) Analysis of infrared spectroscopy characteristics.
Ultraviolet observation: Due to the short wavelength of ultraviolet light, the objective lens has a high resolution, and it is possible to obtain a clear image when observing objects.
(1) Timely discovery of defects in lithography images on silicon wafers; (2) Spectroscopic applications. |
| DL-MMSOL-10x/0.3-95-PlnApo-NIR | 10 | 0.3 | 34 | ||||
|
DL-MMSOL-20x/0.3-95-PlnApo-NIR |
20 | 0.3 | 31 | ||||
|
DL-MMSOL-20x/0.45-95-PlnApo-NIR |
20 | 0.45 | 20.2 | ||||
| DL-MMSOL-50x/0.45-95-PlnApo-NIR | 50 | 0.45 | 20.06 | ||||
|
DL-MMSOL-50x/0.65-95-PlnApo-NIR |
50 | 0.65 | 9.41 | ||||
| DL-MMSOL-20x/0.42-95-PlnApo-NIR | 20 | 0.42 | 20 | ||||
| DL-MMSOL-50x/0.55-95-PlnApo-NIR | 50 | 0.55 | 13 | ||||
|
DL-MMSOL-20x/0.60-95-PlnApo-NIR |
20 | 0.6 | 9.5 | ||||
|
DL-MMSOL-50x/0.67-95-PlnApo-NIR |
50 | 0.67 | 10 | ||||
|
DL-MMSOL-50x/0.75-95-PlnApo-NIR |
50 | 0.75 | 4 | ||||
|
DL-MMSOL-2x/0.055-95-PlnApo |
400~700 | 2 | 0.055 | 33.72 | Visible observations | ||
|
DL-MMSOL-5x/0.14-95-PlnApo |
5 | 0.14 | 45.3 | ||||
|
DL-MMSOL-10x/0.28-95-PlnApo |
10 | 0.28 | 33.4 | ||||
|
DL-MMSOL-20x/0.34-95-PlnApo |
20 | 0.34 | 29.56 | ||||
| DL-MMSOL-50x/0.5-95-PlnApo | 50 | 0.5 | 18.9 | ||||
| DL-MMSOL-100x/0.8-95-PlnApo | 100 | 0.8 | 6 | ||||
| DL-MMSOL-20x/0.42-95-PlnApo-UV | 355~532 | 20 | 0.42 | 17 |
Visible observations Ultraviolet observation Laser processing |
||
| DL-MMSOL-50x/0.65-95-PlnApo-UV | 50 | 0.65 | 10 | ||||
Second, the specific parameters
400-1064nm：
| Product model | DL-MMSOL | ||||||
| Product parameters | Magnification（X） | Numerical aperture（NA） | Working distance（mm） | Field of viewWF10×24（mm） | Field of view1/2 CCD（mm） | Parfocal distance（mm） | Wavelength range（nm） |
|
DL-MMSOL-50x/0.65-95-PlnApo-NIR |
50 |
0.65 |
9.41 |
0.48 |
0.1×0.13 |
95 |
400-1064 |
|
DL-MMSOL-50x/0.45-95-PlnApo-NIR |
50 |
0.45 |
20.06 |
0.48 |
0.1×0.13 |
95 |
400-1064 |
|
DL-MMSOL-20x/0.45-95-PlnApo-NIR |
20 |
0.45 |
20.2 |
1.2 |
0.24×0.32 |
95 |
400-1064 |
|
DL-MMSOL-20x/0.3-95-PlnApo-NIR |
20 |
0.3 |
31 |
1.2 |
0.24×0.32 |
95 |
400-1064 |
|
DL-MMSOL-10x/0.3-95-PlnApo-NIR |
10 |
0.3 |
34 |
2.4 |
0.48×0.64 |
95 |
400-1064 |
|
DL-MMSOL-5x/0.15-95-PlnApo-NIR |
5 |
0.15 |
45 |
4.8 |
0.96×1.28 |
95 |
400-1064 |
| Product parameters | Magnification（X） | Numerical aperture（NA） | Working distance（mm） | Field of view | Parfocal distance（mm） | Wavelength range（nm） | |
| Ф24 Eyepiece | 1" | ||||||
| DL-MMSOL-20x/0.42-95-PlnApo-NIR | 20 | 0.42 | 20 | 1.2 | 0.48×0.64 | 95 | 400-1064 |
| DL-MMSOL-50x/0.55-95-PlnApo-NIR | 50 | 0.55 | 13 |
0.48 |
0.19×0.26 | 95 | 400-1064 |
| DL-MMSOL-20x/0.60-95-PlnApo-NIR | 20 | 0.60 | 9.5 |
1.2 | 0.48×0.64 |
95 | 400-1064 |
| DL-MMSOL-50x/0.67-95-PlnApo-NIR | 50 | 0.67 | 10 |
0.48 | 0.19×0.26 | 95 | 400-1064 |
| DL-MMSOL-50x/0.75-95-PlnApo-NIR | 50 | 0.75 | 4 |
0.48 | 0.19×0.26 | 95 | 400-1064 |
400-700nm：
| Product model | DL-MMSOL | ||||||
| Product parameters | Magnification（X） | Numerical aperture（NA） | Working distance（mm） | Object's field of view（mm） | Like a square field of view（mm） | Parfocal distance（mm） | Wavelength range（nm） |
| DL-MMSOL-100x/0.8-95-PlnApo | 100 | 0.8 | 6 | / | / | 95 | 400-700 |
| DL-MMSOL-50x/0.5-95-PlnApo | 50 | 0.5 | 18.9 | 0.5 | 25 | 95 | 400-700 |
| DL-MMSOL-20x/0.34-95-PlnApo | 20 | 0.34 | 29.56 | 1.25 | 25 | 95 | 400-700 |
| DL-MMSOL-10x/0.28-95-PlnApo | 10 | 0.28 | 33.4 | 2.5 | 25 | 95 | 400-700 |
| DL-MMSOL-5x/0.14-95-PlnApo | 5 | 0.14 | 45.3 | 5 | 25 | 95 | 400-700 |
| DL-MMSOL-2x/0.055-95-PlnApo | 2 | 0.055 | 33.72 | 12.5 | 25 | 95 | 400-700 |
355-532nm：
| Product model | DL-MMSOL | ||||||
| Product parameters | Magnification（X） | Numerical aperture（NA） | Working distance（mm） | Field of view | Parfocal distance（mm） | Wavelength range（nm） | |
| Ф24 Eyepiece | 1" | ||||||
| DL-MMSOL-20x/0.42-95-PlnApo-UV | 20 | 0.42 | 17 | 1.2 | 0.48×0.64 | 95 | 355-532 |
|
DL-MMSOL-50x/0.65-PlnApo-UV |
50 |
0.65 |
10 |
0.48 |
0.19×0.26 |
95 |
355-532 |